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| 1. | AAS
Atomic Absorption Spectroscopy | Atomize (flame, electro, thermal, etc.) | Light, e.g., glow discharge | Absorption spectrum | – | – | Concentration of atomic species (quantitative, using standards) | 1,2 |
| 2. | ICP-AES
Induct. Coupled Plasma – Atomic Emission Spectroscopy | Atomize (flame, electro, thermal, ICP, etc.) | – | Emission spectrum | – | – | Concentration of atomic species (quantitative, using standards) | 3 |
| 3. | Dynamic SIMS
Dynamic Secondary Ion Mass Spectroscopy | Surface | Ion beam (1–20 keV) | Secondary ions; analysis with mass spectrometer | 2 nm–1 µm (or deeper: ion milling) | 0.50 nm | Elemental and isotopic analysis; depth profile (all elements); detection limits: ppb-ppm | 4 |
| 4. | Static SIMS
Static Secondary Ion Mass Spectroscopy | Surface | Ion beam (0.5–20 keV) | Secondary ions, analysis with mass spectrometer | 0.1–0.5 nm | 10 µm | Elemental analysis of surface layers; molecular analysis; detection limits: ppb-ppm | 4 |
| 5. | SNMS
Sputtered Neutral Mass Spectroscopy | Surface, bulk | Plasma discharge; noble gases: 0.5–20 keV | Sputtered atoms ionized by atoms or electrons; then mass analyzed | 0.1–0.5 nm (or deeper: ion milling) | 1 cm | Elemental analysis Z ≥ 3; depth profile; detection limit: ppm | 4,6 |
| 6. | SALI
Surface Analysis by Laser Ionization | Surface | e-beam, ion-beam, or laser for sputtering | Sputtered atoms ionized by laser; then mass analyzed | 0.1–0.5 nm up to 3 µm in milling mode | 60 nm | Surface analysis; depth profiling | 7 |
| 7. | LIMS
Laser Ionization Mass Spectroscopy | Surface, bulk | u.v. laser (ns pulses) | Ionized species; analyzed with mass spectrometer | 50–150 nm | 5 µm–1 mm | Elemental (micro)analysis; detection limits: 1–100 ppm | 8 |
| 8. | SSMS
Spark Source Mass Spectroscopy | Sample in the form of two electrodes | High voltage R.F. spark produces ions | Ions – analyzed in mass spectrometer | 1–5 µm | – | Survey of trace elements; detection limit: 0.01–0.05 ppm | 9 |
| 9. | GDMS
Glow Discharge Mass Spectroscopy | Sample forms the cathode for a D.C. glow discharge | Sputtered atoms ionized in plasma | Ions – analyzed in mass spectrometer | 0.1–100 µm | 3–4 mm | (Bulk) trace element analysis; detection limit: sub-ppb | 9,10 |
| 10. | ICPMS
Induct. Coupled Plasma Mass Spectroscopy | Liquid-dissolved sample carried by gas stream into R.F. induction coil | Ions produced in argon plasma | Ions – analyzed in quadrupole mass spectrometer | – | – | High-sensitivity analysis of trace elements | 11 |
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| 11. | IRS
Infrared Spectroscopy | Thin crystal, glass, liquid | I.R. light (W-filament, globar, Hg-arc) | I.R. spectrum | – | – | Electronic transitions (mainly in semiconductors and superconductors); vibrational modes (in crystals and molecules) | 12,13,14 |
| 12. | FTIR
Fourier Transform I.R. Spectroscopy | Solid, liquid; transmission or reflection | White light (all frequencies) | Fourier transform of spectrum (interferometer) | – | – | Spectra obtained at higher speed and resolution | 15 |
| 13. | ATR
Attenuated Total Reflection | Surface or thin crystal | – | – | µm’s | – | Atomic or molecular spectra of surfaces and films | 16 |
| 14. | (µ)-RS
(Micro-) Raman Spectroscopy | Solid, liquid (1 µm–1 cm) | Laser beam, e.g., Ar-line, YAG-line | Raman spectra | 0.5 µm | 0.5 µm | Molecular and crystal vibrations | 12,14,17 |
| 15. | CARS
Coherent Anti-Stokes Raman Spectroscopy | Solid, liquid (50 µm–3 cm) | Pump beam (ω0)+ probe beam (ωs) | Anti-Stokes spectrum | – | – | High-resolution Raman spectra | 14 |
| 16. | Ellipsometry | Transparent films, crystals, adsorbed layers | Polarized light | Change in polarization | 0.05 nm–5 µm | 25 µm (or sample thickness) | Refractive index and absorption | 18,19 |
| 17. | UPS
Ultraviolet Photoelectron Spectroscopy | Surfaces, adsorbed layers | u.v. light, 10–100 eV; 200 eV (synchrotron) | Electrons | 0.2–10 nm | 0.1–10 nm | Energies of electronic states of surfaces and free molecules | 20,21 |
| 18. | PSD
Photon Stimulated Desorption | Surfaces with adsorbed species | Far u.v. light E > 10 eV | Ions – analyzed with mass spectrometer | 0.1–2 nm | – | Structure and desorption kinetics of adsorbed atoms and molecules | 22 |
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| 19. | XRD
X-Ray Diffraction | Single crystals, powders films | x-rays: λ = 0.05–0.2 nm (6–17 keV) | Diffracted x-ray beam | 1–1000 µm | 0.1–10 mm | Identification of crystallographic structures; all elements (low Z difficult) | 23,24 |
